Patent · US Expired

Method and an apparatus for the treatment of components by a gas mixture

US5938866A · kind A · utility

1Cited by
1References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 25, 1998
Grant dateAug 17, 1999
Priority date
Expiry dateMar 25, 2018

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC21D1/773
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

An apparatus for the treatment of components by means of a gas mixture, comprising mainly a first light gas and minor amounts of a second gas being heavier than the first gas, has a treatment chamber (10) in which the treatment occurs and a concentration, and purification device (19, 29, 30) in which the gas mixture is concentrated and purified to increase the concentration of the first gas. The treatment chamber (10) comprises an outlet member (19) provided in an upper part of the treatment chamber (10) and means (14, 15) being arranged to move the gas mixture upwardly and out through the outlet member (19). Said means may comprise an inlet member (14) provided in a lower part of the treatment chamber (10) and arranged to supply additional gas and to admit a laminar inward flow of said additional gas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.