Yttrium tantalate x-ray phosphors with reduced persistence
US5938974A · kind A · utility
1Cited by
3References
20Claims
0Family size
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Key dates
| Filing date | Sep 10, 1998 |
| Grant date | Aug 17, 1999 |
| Priority date | — |
| Expiry date | Sep 10, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K11/7708
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A composition and method are provided for reducing the persistence of yttrium tantalate x-ray phosphors having the monoclinic M' structure. Persistence is reduced by incorporating a molybdenum or vanadium additive into the phosphor. The method for incorporating the molybdenum or vanadium additive consists of adding a molybdenum or vanadium containing compound to the mixture of raw materials formulated to make the phosphor and firing the mixture at a temperature and for a time sufficient to form the phosphor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.