Patent · US Expired

Semiconductor light emitting device and method of fabricating the same

US5939734A · kind A · utility

9Cited by
6References
6Claims
0Family size

Assignee

Inventor

Key dates

Filing dateFeb 20, 1998
Grant dateAug 17, 1999
Priority date
Expiry dateFeb 20, 2018

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/819
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of fabricating a semiconductor light emitting device includes fabricating, semiconductor light emitting devices on a large scale by forming desirable end surfaces of resonators using an etching process. The method includes the steps of forming, on a base body, semiconductor layers for constituting a plurality of semiconductor light emitting devices; grooving the semiconductor layers formed on the base body in the direction from a front surface of the semiconductor layers to the base body, to form stripe-like grooves; and forming a semiconductor film in the grooves by epitaxial growth; wherein a side surface of each of the grooves, which side surface finally forms an end surface of a resonator of each of the semiconductor light emitting devices, is a crystal plane being later in epitaxial growth rate than a bottom surface of the groove.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.