Method for manufacturing organic monomolecular film
US5942286A · kind A · utility
2Cited by
4References
9Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Oct 18, 1996 |
| Grant date | Aug 24, 1999 |
| Priority date | — |
| Expiry date | Oct 18, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides a method for selectively allowing film-forming molecules to be chemically adsorbed onto an Si substrate to produce a good and robust organic monomolecular film, wherein molecules with SH groups are chemically adsorbed onto the Si substrate to form a monomolecular film of the molecules by heating an As molecular beam source 4 to allow a monoatomic layer thickness of arsenic to be adsorbed onto the clean surface of the Si substrate set on a sample stage 3 and then immersing the Si substrate terminated by arsenic in a solution containing molecules with SH groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.