Patent · US Expired

Method for manufacture of field emission array

US5944573A · kind A · utility

15Cited by
2References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 10, 1997
Grant dateAug 31, 1999
Priority date
Expiry dateDec 10, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2201/30457
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A process for depositing diamond crystals onto a field emission cathode. The process involves providing a cathode having a substrate, a gate layer and a plurality of emitters electrically insulated from the gate layer. An electric bias is applied to the gate layer and a ground potential is applied to the emitters. A heat source is positioned adjacent the cathode, and the cathode is exposed to a field of ions for a sufficient period to at least partially clean the emitters. A carbon containing gas is added to the atmosphere adjacent to the cathode such that carbon ions are dissociated from the gas and deposited on the emitters to form a "soot". The temperature of the cathode is then adjusted to a level which allows formation of diamond film.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.