Electrostatic chuck
US5946183A · kind A · utility
27Cited by
11References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 30, 1996 |
| Grant date | Aug 31, 1999 |
| Priority date | — |
| Expiry date | Aug 30, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/23
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An electrostatic chuck for attracting an object to be treated, includes a substrate, an insulating dielectric layer and at least one electrode provided between the substrate and the insulating dielectric layer, wherein the above object is to be attracted onto the electrode via the insulating dielectric layer and an average thickness of the insulating dielectric layer is not less than 0.5 mm and not more than 5.0 mm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.