Apparatus for machine learning
US5946675A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 20, 1992 |
| Grant date | Aug 31, 1999 |
| Priority date | — |
| Expiry date | Nov 20, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06N20/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An apparatus is disclosed for machine learning of a pattern sequence which is derived from a plurality of inputs. The pattern sequence is predicted from learning rate parameters that are exponentially related to an incrementally calculated gain parameter for each input. The gain parameter are increased or decreased in real time in correlation with the accuracy of the learning process. The disclosed apparatus are advantageously utilized in signal processing, adaptive control systems, and pattern recognition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.