Method of nanoscale patterning and products made thereby
US5948470A · kind A · utility
250Cited by
3References
2Claims
0Family size
Inventors
Key dates
| Filing date | Apr 22, 1998 |
| Grant date | Sep 7, 1999 |
| Priority date | — |
| Expiry date | Apr 22, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N30/6095
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods of nanometer pattern formation and transfer onto a selected substrate are provided wherein a selected block copolymer is coated onto the selected substrate and a component of the block copolymer is chemically modified or physically removed so that the dense periodic pattern of the block copolymer can be transferred onto the selected substrate. Substrates prepared by these methods are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.