Exposing apparatus
US5949526A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 7, 1997 |
| Grant date | Sep 7, 1999 |
| Priority date | — |
| Expiry date | Aug 7, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N1/40031
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The improved apparatus for exposing a light-sensitive material to recording light modulated in accordance with an image to be recorded includes a source of recording light, a multi-channel spatial light modulating element using a liquid crystal, imaging optics with which the recording light modulated with the spatial light modulating element is imaged on the light-sensitive material, and apparatus for adjusting the temperature of the spatial light modulating element. This exposing apparatus ensures that image of high quality (high resolution) can be recorded at high speed by performing multi-channel exposure with an inexpensive and simple device design.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.