Silicon oxide on a substrate

US5952108A · kind A · utility

Assignee

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

• Frank Slootman · Cosne-Cours-sur-Loire, FR
• Pascal Bouard · Draveil, FR
• François Coeuret · Guyancourt, FR
• Eckhard Prinz · Schwarzenbek, DE
• Dominique Jouvaud · Paris, FR

Key dates

• Filing date: Sep 26, 1997
• Grant date: Sep 14, 1999
• Expiry date: Sep 26, 2017

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/31938
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A product substrate coated with a uniform deposit of silicon oxide created by subjecting the substrate to an electrical discharge with a dielectric barrier in the presence of a controlled atmosphere containing a silane and an oxidizing gas, the atmosphere being at a pressure higher than 10,000 Pa, and wherein the atmosphere is maintained in the immediate vicinity of an electrode in the region where the electrical discharge is produced and further wherein any entrainment of oxygen other than that forming part of the atmosphere in the region is prevented.