Spatial light modulator with improved light shield
US5953153A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 1997 |
| Grant date | Sep 14, 1999 |
| Priority date | — |
| Expiry date | Oct 27, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0841
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A spatial light modulator (10) having a micromechanical active portion (12) encompassed by a light shield (14). The light shield (14) is fabricated upon a substrate (36) and has a plurality of openings (72, and 80) to permit underlying layers of photoresist (90, 92) to be undercut from beneath the light shield. Removal of the photoresist layers provides a sufficiently flat light shield, and eliminates the possibility that particles from the photoresist layer could migrate to beneath active micromirrors (30) of the spatial light modulator (12).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.