Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart
US5955221A · kind A · utility
10Cited by
8References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 21, 1997 |
| Grant date | Sep 21, 1999 |
| Priority date | — |
| Expiry date | Nov 21, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J3/38
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Optical patterns and lithographic techniques are used as part of a process to embed parallel and evenly spaced conductors in the non-planar surfaces of an insulator to produce high gradient insulators. The approach extends the size that high gradient insulating structures can be fabricated as well as improves the performance of those insulators by reducing the scale of the alternating parallel lines of insulator and conductor along the surface. This fabrication approach also substantially decreases the cost required to produce high gradient insulators.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.