Rinsing solution
US5964951A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 1997 |
| Grant date | Oct 12, 1999 |
| Priority date | — |
| Expiry date | Dec 23, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/422
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A rinsing solution for lithography which comprises a homogeneous solution of a water-soluble organic solvent and water. The water-soluble organic solvent may be any water-miscible organic solvent that have been used as solvents or rinsing solutions for resists or anti-reflective coatings. Preferred examples of the water-soluble organic solvent are a mixture of propylene glycol monoethyl ether and propylene glycol monometyl ether acetate, a mixture of propylene glycol monomethyl ether and propylene glycol monometyl ether acetate, and ethyl lactate. This rinsing solution is useful for dissolving away or stripping away cured or non-cured unnecessary resists, anti-reflective coatings, etc. from substrates such as in integrated circuit elements, color filters, liquid crystal display elements, etc. or from a resist-applying apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.