Apparatus for projecting electromagnetic radiation with a tailored intensity distribution
US5967652A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 1998 |
| Grant date | Oct 19, 1999 |
| Priority date | — |
| Expiry date | Mar 30, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/66
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus is disclosed that efficiently projects electromagnetic radiation over a predetermined spherical sector with a tailored intensity distribution. The apparatus includes a base having a cavity and aperture that faces the spherical sector to be illuminated, with a flat, ring-shaped shoulder surrounding the aperture. The apparatus further includes a mask spaced over the aperture and a baffle projecting from the mask toward the aperture. The base, the mask, and the baffle are formed of a material having an outer surface with a significant diffuse, reflective characteristic. A source emits electromagnetic radiation (e.g., visible light) into the base cavity, and the base, mask and baffle are configured to redirect this radiation outwardly with the tailored intensity distribution (e.g., a uniform distribution) over the predetermined spherical sector (e.g., a hemisphere, or 2 .pi.steradians).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.