Device for sputter deposition of thin layers on flat substrates

US5968328A · kind A · utility

Assignee

• Leybold Systems GmbH · DE

Inventors

• Gotz Teschner · Hanau, DE
• Joachim Szczyrbowski · Goldbach, DE
• Karl-Heinz Grosse · Grundau, DE

Key dates

• Filing date: Dec 11, 1997
• Grant date: Oct 19, 1999
• Expiry date: Dec 11, 2017

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/568
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In an apparatus for the sputter deposition of thin electrically insulating layers on substrates (33, 33', . . . ) there is provided in an evacuable chamber which is connected to a treatment gas source, a first pair of tubular magnetron cathodes (5, 5' or 31) and at least one additional pair of magnetron cathodes (6, 6' or 25, 26 or 30, 32), a medium frequency generator (10) connected in series with a transformer (9), where the two secondary winding outputs (11, 12) of said transformer are each connected with the cathodes of a second pair (6, 6' or 25, 26 or 30, 32) and where direct current can be fed into the supply lines for the first cathode pair (31) via a center tap (15) of the transformer (9) and a network (17 or 13, 14).