X-ray mask and its fabrication method
US5970114A · kind A · utility
5Cited by
2References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 29, 1997 |
| Grant date | Oct 19, 1999 |
| Priority date | — |
| Expiry date | Aug 29, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are X-ray masks exhibiting improved stability and reliability of the X-ray masks, and methods of making these masks. The X-ray masks include a membrane, an X-ray absorber pattern on the membrane, which is formed on a top side of a substrate, or an oxide layer between the membrane and the X-ray absorber pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.