Process detection system for plasma process
US5971591A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 1997 |
| Grant date | Oct 26, 1999 |
| Priority date | — |
| Expiry date | Oct 20, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3299
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Plasma process control arrangement controls a plasma generator that provides electrical power to a plasma chamber for an RF or DC plasma process. A sensor system detects operating parameters of the electrical power, including voltage and current levels. A process detection system (pds) controller has inputs coupled to the sensor system to receive the operating parameters, a programmable memory unit for storing a control program to compute an output control signal based on the operating parameters, and a control output coupled to a control input of the plasma generator. An external computer device, includes a monitor, an icon copying device for example, a mouse suitable for drag-and-drop operation, and a memory storing a suitable code-building program for generating a user-selected control program according to user-determined process requirements. Respective graphical icons are presented on the monitor and are selected and connected by use of the icon copying device to represent logic processing of the operational parameters, and the external computer device creates the corresponding user-selected control program. The user-selected control program is downloaded from the external com…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.