Aqueous compositions for making ultrapure water used in microelectronic device fabrication processes and methods of sterilizing ultrapure water delivery systems using the same
US5972293A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 1998 |
| Grant date | Oct 26, 1999 |
| Priority date | — |
| Expiry date | Apr 17, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S210/90
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Compositions for making ultrapure water in microelectronic device fabrication processes comprise hydrogen peroxide, peracetic acid, and water. Methods of sterilizing ultrapure water delivery systems for use in microelectronic device fabrication processes comprise contacting ultrapure water delivery systems with water having temperatures ranging from about 26.degree. C. to about 40.degree. C.; and sterilizing the ultrapure water delivery systems with compositions comprising hydrogen peroxide, peracetic acid, and water. The ultrapure water delivery systems comprise water tanks, heat exchangers in fluid communication with the water tanks, ultraviolet sterilizers in fluid communication with the heat exchangers, OR-polishers in fluid communication with the ultraviolet sterilizers, MB-polishers in fluid communication with the OR-polishers, and ultrafilters in fluid communication with the OR-polishers. The compositions employed in the sterilizing step do not contact the OR-polishers and the MB-polishers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.