Method for selecting silicon metalloid having improved performance in the direct process for making organohalosilanes
US5973177A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1998 |
| Grant date | Oct 26, 1999 |
| Priority date | — |
| Expiry date | Jul 29, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N31/005
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for selecting chemical grade silicon metalloid having improved performance in a direct process for making organohalosilanes. The method comprises (A) heating a chemical grade silicon metalloid sample at a temperature ramp speed controlled to effect a stepwise reduction of oxide impurities present in the chemical grade silicon metalloid to a temperature greater than about 2300.degree. C. in the presence of a carbon source thereby effecting the formation of a reduction product consisting of carbon monoxide and carbon dioxide, (B) determining the amount of the reduction product formed above a temperature of about 1900.degree. C., and (C) selecting a chemical grade silicon metalloid for use in the direct process for making organohalosilanes based upon the amount of the reduction product formed above a temperature of about 1900.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.