Galvanic deposition cell with an adjusting device

US5976329A · kind A · utility

Assignee

• Sonopress Produktionsgesellschaft für Ton- und Informationsträger mbH · DE

Inventors

• Michael Bock · Pittsburgh, US
• Wittold Krawczyk · Gütersloh, DE
• Klaus Prenzel · Gütersloh, DE
• Rudolf Opitz · Gütersloh, DE

Key dates

• Filing date: Mar 13, 1998
• Grant date: Nov 2, 1999
• Expiry date: Mar 13, 2018

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C25D1/10
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

This invention relates to an apparatus for the galvanic deposition of a ml layer on a substrate. The apparatus comprises a container for holding an electrolyte, and an anode container filled with an anode material and having an essentially planar exit surface for the metal ions of the anode material. A substrate holder is connected to a drive shaft that is supported in a drive means mounted on a cover of the container. The cover is pivotable about a pivoting axis of a pivoting means mounted on the side of the container opposite to the anode container. An adjusting plate permits the substrate surface to be adjusted with respect to the exit surface of the anode container facing the substrate surface. The invention provides a more uniform deposition of metal ions on the substrate surface.