Method for destroying organohalogen compounds
US5977427A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Jun 5, 1996 |
| Grant date | Nov 2, 1999 |
| Priority date | — |
| Expiry date | Jun 5, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process is provided for the destruction of organohalogen compounds, such as methyl chloride, chloroform, carbon tetrachloride, etc., by mixing the organohalogen compounds with a heated carrier gas, such as nitrogen, argon or air, and either steam or water to form a mixture; supplying the mixture to a catalyst, such as titanium oxide/tungsten oxide, to decompose the organohalogen compounds into halogens and hydrogen halides, such as chlorine, hydrochloric acid, fluorine and hydrofluoric acid; conducting the halogen and hydrogen halide contaminated gas through a bent path, created by a baffle that prevents the entry of mist or droplets into the catalyst chamber, into a cooling section where the halogen and hydrogen halide contaminated gas is sprayed with water to cool the gas to a temperature low enough to prevent the formation of dioxines. An alkaline agent, such as sodium hydroxide, can be added to the cooling water to neutralize the halides and hydrogen halides.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.