Resist coating film
US5981146A · kind A · utility
3Cited by
8References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 28, 1997 |
| Grant date | Nov 9, 1999 |
| Priority date | — |
| Expiry date | Jan 28, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
When a fine pattern is formed by using a chemical-amplification-type resist film, fall of acid in the surface of the resist can be inhibited so that a fine pattern exhibiting an excellent shape is formed. A resist coating film containing a compound having a sulfonic acid group or a carbonic acid group is formed on a chemical-amplification-type resist film of a semiconductor substrate, followed by performing exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.