Raster-scan photolithographic reduction system
US5982475A · kind A · utility
27Cited by
17References
37Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 30, 1997 |
| Grant date | Nov 9, 1999 |
| Priority date | — |
| Expiry date | Sep 30, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70058
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reduction photolithographic scanning system uses a reduction lens with a circular image field that is shaped to an irregular hexagonal configuration affording different effective scanning widths so that the full area of a microcircuit image can be scanned onto a substrate in an integer number of overlapping scans. This minimizes the number of scans required for each image area and maximizes the total image area that can be scanned per time unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.