Sputter load lock O-ring cleaner
US5983438A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Mar 13, 1998 |
| Grant date | Nov 16, 1999 |
| Priority date | — |
| Expiry date | Mar 13, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B1/165
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning apparatus and method for removing debris from the seals of a pressurized enclosure, specifically a sputter load lock chamber. The cleaning apparatus includes a load lock replacement door, a cleaning tool, and a seal. The load lock replacement door includes a surface that seals the opening of the load lock chamber so as to maintain a desired vacuum pressure in the load lock chamber. The sealing surface supports a cleaning tool. The cleaning tool and the sealing surface are supported by a vacuum seal which limits leakage of gas at ambient conditions into the load lock chamber. Once the tool is installed, the load lock chamber is pumped-down to a desired vacuum pressure. The tool is manipulated as necessary to remove debris from the seals of the load lock chamber. Once the cleaning process has been completed, the load lock chamber is vented, the tool removed, and the load lock door closed and sealed. The load lock chamber is restored to the desired operating vacuum pressure and the machine is placed back on-line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.