Piezoelectric thin-film element and ink-jet recording head using the same
US5984458A · kind A · utility
21Cited by
4References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 20, 1996 |
| Grant date | Nov 16, 1999 |
| Priority date | — |
| Expiry date | Dec 20, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N30/2047
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A substrate; a silicon dioxide film formed on the substrate; a platinum lower electrode formed on the silicon dioxide film; a piezoelectric film formed on the platinum lower electrode; and an upper electrode formed on the piezoelectric film, wherein the relationship between a film thickness (X) of the platinum lower electrode and a film thickness (Y) of the silicon dioxide film satisfies conditions of EQU 0.5.ltoreq.X/Y.ltoreq.4, and EQU 3,000 .ANG..ltoreq.X.ltoreq.2 .mu.m.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.