Remote-plasma-CVD method for coating or for treating large-surface substrates and apparatus for performing same
US5985378A · kind A · utility
54Cited by
5References
4Claims
0Family size
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Key dates
| Filing date | Oct 17, 1997 |
| Grant date | Nov 16, 1999 |
| Priority date | — |
| Expiry date | Oct 17, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The remote-plasma-CVD process for coating or treating large-surface substrates includes exciting an excitation gas located remotely from a substrate surface to be coated or treated in modular plasma source devices arranged either in a linear arrangement or in a planar, grid-like arrangement over the substrate surface and feeding a reactant gas with the excitation gas from the plasma source devices to the substrate surface to excite the reactant gas with the excitation gas and thus form a coating on the substrate surface or treat the substrate surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.