Patent · US Expired

Optical structure and method for its production

US5987208A · kind A · utility

29Cited by

3References

11Claims

0Family size

Assignee

Siemens Aktiengesellschaft · DE

Inventors

Ulrike Gruning · Hopewell Junction, US
Volker Lehmann · Hersbruck, DE

Key dates

Filing date	Jan 7, 1998
Grant date	Nov 16, 1999
Priority date	—
Expiry date	Jan 7, 2018

Classification

Technology area (CPC G)Physics
CPC primaryG02B2006/12176
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical structure which is suitable as an optical waveguide or cavity comprises a carrier having a lattice structure with a photonic band gap and a defect region. The lattice structure comprises pores which have constriction and are arranged in a periodic grid pattern which is disturbed in the defect region. The optical structure can be produced by the electrochemical etching of silicon.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.