Aqueous stripping and cleaning compositions
US5988186A · kind A · utility
23Cited by
21References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 16, 1997 |
| Grant date | Nov 23, 1999 |
| Priority date | — |
| Expiry date | Oct 16, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An aqueous stripping composition comprising a mixture of a polar amine, an organic or inorganic amine and a corrosion inhibitor which is gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.