Copolymer of vinylpyrrolidone and vinylimidazole
US5990269A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Nov 21, 1997 |
| Grant date | Nov 23, 1999 |
| Priority date | — |
| Expiry date | Nov 21, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The improved water-soluble photosensitive resin composition comprises a high-polymer compound represented by the general formula (I): ##STR1## (where X is Na, K or NH.sub.4) and a water-soluble polymer which is either polyvinylpyrrolidone or a copolymer of vinylpyrrolidone and vinylimidazole or both. The composition is applied to a substrate, exposed through a mask pattern and developed to form a photocured pattern and, thereafter, a light absorber is applied to the entire surface of the substrate and dried, followed by stripping away the photocured pattern and the overlying light absorber to form a black matrix pattern. The composition is suitable for use as a photoresist in the manufacture of black matrices as on color CRTs and capable of efficient formation of photocured patterns with high sensitivity by shorter times and lower intensities of exposure. In addition, the composition adheres strongly to glass substrates and is capable of pattern formation as thin film that is faithful to the mask pattern used. A vinylpyrrolidone/vinylimidazole copolymer is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.