Electrode structure, electrolytic etching process and apparatus
US5993637A · kind A · utility
47Cited by
10References
49Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1997 |
| Grant date | Nov 30, 1999 |
| Priority date | — |
| Expiry date | Dec 3, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/548
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An electrode structure is constituted by a first electrode, and at least one second electrode providing a pair of opposite portions with a prescribed spacing therebetween at which the first electrode is disposed. The electrode structure is suitably used for electrolytic etching and is effective in providing an accurate etching pattern without damaging the surface of an etching object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.