Stain resistant protective overcoat for imaged photographic elements
US5994005A · kind A · utility
2Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 5, 1998 |
| Grant date | Nov 30, 1999 |
| Priority date | — |
| Expiry date | Feb 5, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is an imaged photographic element including a support, having at least one silver halide emulsion layer, and having at least one stain resistant overcoat layer. The stain resistant overcoat layer contains a fluoro(meth)acrylate interpolymer having two different segments, one of which is fluorinated and oleophobic and the other of which is hydratable. The stain resistant overcoat is applied to the photographic element after film processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.