Acid-sensitive substance and photosensitive compositions therewith
US5994023A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 21, 1997 |
| Grant date | Nov 30, 1999 |
| Priority date | — |
| Expiry date | Jul 21, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/145
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to the present invention there is provided a polymer not comprising maleic acid derivatives having acid labile groups pendant from the polymer backbone, characterized in that said pendant groups are represented by EQU --L--(C.dbd.O)--O--(C.dbd.O)--O--C--R.sup.1 R.sup.2 R.sup.3, wherein L represents a divalent linking group bonded to the polymer backbone, R.sup.1 represents an alkyl group of which the linking C atom comprises at least one hydrogen and R.sup.2 and R.sup.3 each independently represent a hydrogen or an alkyl group or R.sup.1 and R.sup.2 or R.sup.2 and R.sup.3 form together a ring compound still with the proviso that the linking C atom of R.sup.1 comprises at least one hydrogen. According to the present invention there is further provided a novel photosensitive composition comprising a latent Bronsted acid and a polymer having acid labile groups pendant from the polymer backbone as described above.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.