Curable compositions containing photosensitive high performance aromatic ether polymers
US5994425A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 29, 1996 |
| Grant date | Nov 30, 1999 |
| Priority date | — |
| Expiry date | Aug 29, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/905
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.