Method and apparatus for exposing photosensitive materials
US5995195A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 1996 |
| Grant date | Nov 30, 1999 |
| Priority date | — |
| Expiry date | Aug 12, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An apparatus for exposing photosensitive materials includes a plurality of light sources for generating beams having different wavelengths, a polygon mirror for scanning and exposing the beams toward a color photosensitive material, and one or more f .theta. lenses disposed on an optical path between the photosensitive material and the polygon mirror. The polygon mirror and the f .theta. lenses are arranged, with respect to the beam from a light source having an intermediate wavelength among the light sources, such that reflection points corresponding to both ends of beam scanning on reflection surfaces of the polygon mirror pass through an identical point on an optical axis of the f .theta. lenses, and light beams at the both ends of beam scanning have line symmetry with respect to the optical axis of the f .theta. lenses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.