Polishing composition
US5997620A · kind A · utility
43Cited by
1References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 27, 1998 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Nov 27, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/1463
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A polishing composition for polishing a memory hard disk comprising water and at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, which further contains an iron compound dissolved in the composition, said iron compound being selected from the group consisting of iron(III) nitrate, iron(III) sulfate, ammonium iron(III) sulfate, iron(III) perchlorate and an ion salt of an organic acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.