Aqueous stripping and cleaning compositions
US5997658A · kind A · utility
23Cited by
3References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 9, 1998 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Jan 9, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.