Galvanic deposition cell with a substrate holder
US5997701A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 9, 1998 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Feb 9, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D1/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to an apparatus for the galvanic deposition of a metal layer on a substrate and comprises a substrate holder connected to a drive shaft that extends in a direction perpendicular to a surface of the substrate. The cathode current is supplied to the substrate by the drive shaft. The drive shaft has an outer insulating layer. The substrate is held in contact with a contact plate by a supporting ring on the outer periphery of a supporting plate. The contact plate rests on a base of the supporting plate and has a central sleeve connectable with the drive shaft. A mounting portion is provided in the base around the sleeve and a tube portion is inserted into the mounting portion in a sealing and detachable manner. An internally threaded ring is arranged on the drive shaft and is shiftable along the longitudinal axis of the drive shaft. The internally threaded ring is detachably connectable to the tube portion and seals the tube portion and the drive shaft from intrusion of the electrolyte material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.