Rectangular filtered arc plasma source
US5997705A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 14, 1999 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Apr 14, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3266
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus is disclosed for generating oppositely directed streams of plasma for the purpose of depositing a coating or performing ion processing. The plasma comprises ionized vapor of a cathode material, generated by vacuum arc evaporation from a linear magnetron cathode. The plasma is diverted by a deflection electrode to a substrate region, while the macroscopic droplets of cathode material also generated by the arc are intercepted and prevented from reaching the substrate. Magnetic means are disclosed for controlling the arc motion on the cathode surface while simultaneously deflecting and guiding the plasma. The source may be extended indefinitely in length, permitting coating or ion processing of large substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.