Process for producing a deposit comprising silica on the surface of a glass product

US5997948A · kind A · utility

Assignee

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

• Sami Dick · Le Chesnay, FR
• Bernard Genies · Les Ulis, FR
• Lahcen Ougarane · Montigny-le-Bretonneux, FR
• Patrick Recourt · Marcoussis, FR

Key dates

• Filing date: Nov 28, 1994
• Grant date: Dec 7, 1999
• Expiry date: Nov 28, 2014

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C2218/152
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A deposit of a silica base layer is formed on the surface of a glass product by projecting on a hot surface of the product, in a non confined ambient atmosphere, a gaseous mixture having a silane content lower than 2%, an oxygen content between 3.5 and 30%, and advantageously a hydrogen content lower than 5%. The surface of the object to be treated is advantageously heated immediately before being sent to the injection station.