Proximity exposure device with distance adjustment device
US5999245A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 26, 1998 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Mar 26, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A proximity exposure device with a distance adjustment device in which sufficient determination sensitivity can be obtained even in areas with a low reflectance factor, such as on a glass surface, is achieved by a distance measurement part having a light source for measurement purposes, a pinhole plate, an objective lens, a light detection device and the like, light emerging form the light source for measurement purposes being emitted via the pinhole plate and objective lens onto the mask surface/workpiece surface, and light reflected thereby is detected via the objective lens and pinhole plate by the light detection device. If the mask surface/workpiece surface is located at the focal point of the objective lens on the object side, reflected light with high intensity is incident in the light detection device. To measure the distance between the mask and workpiece, the distance measurement part is moved in the Z-direction and two peaks of intensity of the reflected light of mask M and workpiece W are determined. Based on the position of the distance measurement part at this time, the distance between the mask and workpiece is determined. After measuring the distance between the mas…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.