Laser adjustment mechanism
US5999346A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 14, 1998 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Aug 14, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01C15/002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved laser adjustment mechanism providing precision alignment of the laser in two dimensions. The mechanism includes a pair of biased threaded mechanisms orthogonally captured by a laser module, which are adjustable to pivot the laser in a plane substantially even with the plane of the laser light emission. The threaded mechanisms are adjustable from the exterior of the level and can precisely align the laser device by placing the device on a surface. A first laser spot is measured at a distant plane, then the device is turned over on the same surface and a second target spot is measured on the same plane. The laser is adjusted half way between the two target spots to precisely align the pitch of the device. The device then can be turned on the side to align the yaw of the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.