Lithography exposure device

US6002466A · kind A · utility

Assignees

• DEUTSCHES ZENTRUM FÜR LUFT—UND RAUMFAHRT E.V. · DE
• Institut für Mikroelektronik Stuttgart · DE

Inventors

• Uwe Brauch · Heitersheim, DE
• Hans Opower · Krailling, DE
• Bernd Hoefflinger · Sindelfingen, DE
• Reinhard Springer · Sulz, DE

Key dates

• Filing date: Mar 26, 1998
• Grant date: Dec 14, 1999
• Expiry date: Mar 26, 2018

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/704
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithography exposure device allows more effective production of small structures within a short time by lithography. The device includes a retainer for a substrate, an exposure unit for producing a light spot on the light-sensitive layer of the substrate, a motion unit for producing apparent motion between the exposure unit and the retainer, and a control unit for controlling the intensity and position of the light spot on the light-sensitive layer. The exposure unit has several solid-state lasers, and a focusing unit that guides the laser beam of each solid-state laser to a light spot of a defined light spot pattern. The entire light spot pattern and the retainer are displaceable relative to each other in an exposure motional direction. Moreover, the light spots of the light spot pattern which correspond to the form of the partial areas to be exposed can be activated or deactivated.