Method and apparatus for generating X-ray or EUV radiation
US6002744A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 1998 |
| Grant date | Dec 14, 1999 |
| Priority date | — |
| Expiry date | Oct 21, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/003
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method for generating X- or EUV-radiation via laser plasma emission, in which at least one target (17) is generated in a chamber, and at least one pulsed laser beam (3) is focused on the target in the chamber. The target is generated in the form of a jet (17) of a liquid, and the laser beam (3) is focused on a spatially continuous portion of the jet (17). An apparatus for generating X- or EUV-radiation via laser plasma emission according to the method comprises a means for generating at least one laser beam (3), a chamber, a means (10) for generating at least one target (17) in the chamber, and a means (13) for focusing the laser beam (3) on the target (17) in the chamber (8). The target-generating means (10) is adapted to generate a jet (17) of a liquid. The focusing means (13) is adapted to focus the laser beam (3) on a spatially continuous portion of the jet (17).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.