Vapor deposition apparatus
US6007634A · kind A · utility
6Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 2, 1997 |
| Grant date | Dec 28, 1999 |
| Priority date | — |
| Expiry date | Sep 2, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4586
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus (10) for decomposing and depositing gaseous metal carbonyls on a mandrel (36). A base plate (12) and cover (14) define a reaction chamber (20). A mandrel ring (28), nested within the base plate (12) and insulated therefrom, supports the mandrel (36). Heat transfer fluid flows through the mandrel ring (28) and into the mandrel (36) to maintain the mandrel (36) at a predetermined temperature to initiate thermal decomposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.