Patent · US Expired

Vapor deposition apparatus

US6007634A · kind A · utility

6Cited by
5References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 2, 1997
Grant dateDec 28, 1999
Priority date
Expiry dateSep 2, 2017

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/4586
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An apparatus (10) for decomposing and depositing gaseous metal carbonyls on a mandrel (36). A base plate (12) and cover (14) define a reaction chamber (20). A mandrel ring (28), nested within the base plate (12) and insulated therefrom, supports the mandrel (36). Heat transfer fluid flows through the mandrel ring (28) and into the mandrel (36) to maintain the mandrel (36) at a predetermined temperature to initiate thermal decomposition.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.