Patent · US Expired

Method and apparatus for applying protective coatings on reflective layers

US6007875A · kind A · utility

8Cited by
0References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 9, 1998
Grant dateDec 28, 1999
Priority date
Expiry dateFeb 9, 2018

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B1/18
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A process for applying a protective coating on the reflective layer of projector reflectors by means of plasma polymerization is provided, where a first protective layer which was applied on the reflective layer in a vacuum chamber by plasma polymerization of an organic silicon compound, is provided by means of a plasma in the same processing chamber, under uninterrupted vacuum conditions, with a second, hydrophilic layer substantially composed of a hydrocarbon skeleton and polar functional groups linked thereto, use is made of an apparatus which comprises a plurality of treatment stations (8, 9, 10) held by a fixed, circular cylindrical vacuum chamber wall (16) and a rotatable inner wall cylinder (17) which is enclosed by said vacuum chamber wall (16) and which holds four substrate chambers (12 through 15) and where the wall of the vacuum chamber (16) is provided with four openings (3 through 6) with which the substrate chambers (3 through 6) can be aligned and through which openings the treatment material can act upon the substrates (2, 2', . . . ), with an outer wall (21, 21', . . . ) which encloses the vacuum chamber wall (16) from the outside and extends radially outward from …

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.