Lithographic developer containing surfactant
US6007970A · kind A · utility
4Cited by
6References
1Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Feb 27, 1995 |
| Grant date | Dec 28, 1999 |
| Priority date | — |
| Expiry date | Feb 27, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is a lithographic developer used to develop a resist pattern having regions with different sizes and shapes, by dissolving and removing a resist region of a resist layer formed in the resist pattern, wherein the developer comprises a surfactant capable of increasing the dissolution of a resist in the resist region to be dissolved and removed, having a smaller dissolving-and-removing area on the surface of the resist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.