Method for allowing a particle to follow a path
US6014151A · kind A · utility
5Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 5, 1997 |
| Grant date | Jan 11, 2000 |
| Priority date | — |
| Expiry date | Nov 5, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T17/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method, apparatus, and article of manufacture for allowing a particle to follow a path. A one dimensional path having an attraction force which affects particles is embodied in N-dimensional space, such as two dimensional or three dimensional space. The attraction force is then applied to the particle in the direction of the path, where the magnitude of the force corresponds to the distance between the particle and the path. The attraction force may optionally be applied for only a percentage of the path length.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.