Laser materials and microlasers having high active ion concentrations, and production processes
US6014393A · kind A · utility
12Cited by
4References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 19, 1997 |
| Grant date | Jan 11, 2000 |
| Priority date | — |
| Expiry date | Jun 19, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/1643
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to an active laser material having a base material doped with active ions, giving said base material laser properties, the ion concentration being equal to or higher than 2%. The invention also relates to a microlaser produced with such a material, as well as a process for producing such a material. The microlaser incorporates an active medium (6) produced by epitaxial growth on a substrate (8), the latter then being removable, as well as microlaser cavity mirrors (2, 4). A pumping beam (10) makes it possible to optically pump the cavity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.