Stable inorganic polymers
US6015457A · kind A · utility
19Cited by
72References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 1998 |
| Grant date | Jan 18, 2000 |
| Priority date | — |
| Expiry date | Mar 12, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Processes for producing poly (hydrido siloxane) copolymers and processes for producing solutions of such copolymers for coating semiconductor substrates are provided. The copolymers have the general formula: (HSiO.sub.1.5).sub.a (HSiO(OR)).sub.b (SiO.sub.2).sub.c, wherein R is a mixture of H and an alkyl group having between 1 and 4 carbon atoms; a+b+c=1; 0.5<a<0.99; 0.01<b<0.5; and 0<c<0.5. Processes for producing the copolymers use alkoxysilanes as starting materials. Processes for producing coating solutions include removal of water and alcohol. Films of such coating solutions are useful as planarizing dielectric layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.