Patent · US Expired

High vertical aspect ratio thin film structures

US6015599A · kind A · utility

29Cited by
1References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 6, 1995
Grant dateJan 18, 2000
Priority date
Expiry dateJun 6, 2015

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24744
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

This invention relates to the area of microelectromechanical systems in which electronic circuits and mechanical devices are integrated on the same silicon chip. The method taught herein allows the fabrication of thin film structures in excess of 150 microns in height using thin film deposition processes. Wafers may be employed as reusable molds for efficient production of such structures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.